SAN JOSE — Immersion lithography is supposed to be the savior for the semiconductor industry, but is the technology is all wet? While the lithography-tool vendors are hyping the technology, Intel Corp ...

SAN JOSE — Tool vendors don't see any technology roadblocks so far for immersion lithography, and expect to decide on the technology's feasibility by the end of the year or soon after. All three of ...

Demonstrating significant progress in all aspects of the technology, 193nm immersion lithography is on track for insertion into volume manufacturing, with good prospects for extendibility to ...

The disclosure is further evidence that 193-nm immersion — with some form of a double-patterning technique — can scale much further than previously thought. It also means that extreme ultraviolet (EUV ...

Nano-electronics research center imec and Cadence Design Systems have announced that the companies completed the first tapeout of a 5nm test chip using extreme ultraviolet (EUV) as... Burn J Lin, VP ...

Backed by a partnership with CoreLab, founded by former Arm China CEO Allen Wu, the move positions Tenstorrent as a ...

Intel plans to do 22 nm in 2011. EUV will not be ready for volume production in 2011. Maybe a year later, in 2012 and Intel won’t wait for it. Intel intends to extend 193 nm immersion lithography with ...

New data on the properties of potential "liquid lenses" compiled by the National Institute of Standards and Technology (NIST) could help the semiconductor industry continue to shrink feature sizes on ...

To make smaller transistors so chips can pack more gates and deliver higher performance, lithography must use shorter light wavelengths to form the smaller features. To that end, developments to ...

Gigaphoton has released a 90W argon-fluoride excimer laser for use in next-generation semiconductor manufacturing. With a power output of 90 W and a repetition rate of 6000 Hz, the new ArF excimer ...

Thanks to a joint effort, an immersion lithography tool with an ultra-high numerical aperture (NA = 1.3) and 193-nm wavelength is on the horizon. Exitech's MS-193i microexposure device will help speed ...

IBM announced last month that it had fabricated the smallest high-quality line patterns ever created by optical lithography. Jacqueline Hewett spoke to the researchers involved to find out how they ...